I-ASML, inkokeli yehlabathi kwiinkqubo ze-semiconductor lithography, isanda kubhengeza ukuphuhliswa kweteknoloji entsha ye-ultraviolet (EUV) ye-lithography. Le teknoloji kulindeleke ukuba iphucule kakhulu ukuchaneka kokuveliswa kwe-semiconductor, eyenza ukuveliswa kweetshiphu ezineempawu ezincinci kunye nokusebenza okuphezulu.
Inkqubo entsha ye-EUV lithography inokufikelela kwisisombululo ukuya kuthi ga kwi-nanometers eyi-1.5, uphuculo olukhulu kwisizukulwana sangoku sezixhobo zelithography. Oku kuchaneka okuphuculweyo kuya kuba nefuthe elinzulu kwizinto zokupakisha ze-semiconductor. Njengoko iitshiphusi zisiba zincinci kwaye zintsonkothe ngakumbi, imfuno yeeteyiphu zokuthwala ezichanekileyo, iiteyiphu zokugquma, kunye neereli zokuqinisekisa ukuthuthwa okukhuselekileyo kunye nokugcinwa kwezi zinto zincinci ziya kunyuka.
Inkampani yethu izibophelele ekulandeleni ngokusondeleyo le nkqubela phambili yetekhnoloji kushishino lwesemiconductor. Siza kuqhubeka ukutyala imali kuphando nakuphuhliso ukuze siphuhlise imathiriyeli yokupakisha enokufikelela kwiimfuno ezintsha eziziswa bubuchwephesha obutsha be-ASML, ibonelela ngenkxaso ethembekileyo kwinkqubo yokwenziwa kwe-semiconductor.
Ixesha lokuposa: Feb-17-2025