I-ASML, inkokheli yehlabathi kwiinkqubo ze-semiconductor lithography, isandula ukubhengeza uphuhliso lwetekhnoloji entsha ye-ultraviolet (EUV) lithography. Le teknoloji kulindeleke ukuba iphucule kakhulu ukuchaneka kokwenziwa kwe-semiconductor, ivumele ukuveliswa kweetships ezineempawu ezincinci kunye nokusebenza okuphezulu.
Inkqubo entsha ye-lithography ye-EUV inokufikelela kwisisombululo esifikelela kwi-1.5 nanometers, uphuculo olukhulu xa kuthelekiswa nesizukulwana sangoku sezixhobo ze-lithography. Oku kucocwa okuphuculweyo kuya kuba nefuthe elikhulu kwizixhobo zokupakisha ze-semiconductor. Njengoko iitships ziba zincinci kwaye zintsonkothile, imfuno yeeteyiphu zokuthwala ezichanekileyo kakhulu, iiteyiphu zokugquma, kunye neereyile ukuqinisekisa ukuthuthwa kunye nokugcinwa okukhuselekileyo kwezi zinto zincinci iya kwanda.
Inkampani yethu izibophelele ekulandeleni ngokusondeleyo olu phuculo lwetekhnoloji kwishishini le-semiconductor. Siza kuqhubeka nokutyala imali kuphando nophuhliso ukuze siphuhlise izixhobo zokupakisha ezinokuhlangabezana neemfuno ezintsha ezibangelwe yitekhnoloji entsha ye-lithography ye-ASML, enika inkxaso ethembekileyo kwinkqubo yokwenziwa kwe-semiconductor.
Ixesha leposi: Februwari-17-2025